Page 25 - North American Clean Energy July August 2015

Figure 2: Process low diagram for the management of gases from the manufacture Figure 3: Process low diagram for the management of gases from the manufacture of crystalline

of crystalline silicon based PV panels
silicon and amorphous silicon based PV panels in which chamber clean uses NF3. (Lines as before,
with red lines added where the risk proile has changed because of the change of process.)

such as nitrogen triluoride. Managing the waste byproducts, which include lammable, of their safe management from the tool, to the point-of-use gas treatment units, and then
corrosive or condensable gases, the silica powder or waste water, is essential. Simple low the management of the wastes generated by such processes.

sheets for the treatment of waste gases from both crystalline and amorphous silicon layer he change of manufacturing process from conventional crystalline to a heterojunction,
manufacture are presented in igures 2 and 3.
involving a luorine-based chamber clean step, which is associated with the amorphous
he process change needs chamber clean stages within the manufacturing cycle. silicon deposition stage, requires careful forethought regarding the challenges presented by
Fluorine-based gases, such as nitrogen triluoride, NF3, are activated either by remote
such a change.

or in-situ plasmas to generate luorine for the purposes of performing the clean activity.
he use of this clean step generates waste gases that contain untransformed clean gases Stewart Davidson is the brand and communications marketing manager at Edwards Vacuum.
(NF3), active clean gases (F2), and products of the reaction of the clean gas with the
contamination on the chamber components (silicon tetraluoride, SiF4). hese waste gases Edwards Vacuum | www.edwardsvacuum.com

represent a new challenge for the conventional crystalline photovoltaic industry in respect

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North American Clean Energy 25