Annealsys manufactures Rapid Thermal Processing (RTP) and Chemical Vapor Deposition systems. Their RTP systems, with cold-wall chamber, high-temperature lamp furnace, and high-vacuum capability, are from three inches to 200 mm for RTP and RTCVD processes. They also have MOCVD systems with direct-liquid injection vaporizers for deposition of metals, oxides, nitrides, carbon nanotubes, and III-V and II-VI materials. Annealys also offers a two-inch system, with in-situ annealing capability, for MOCVD and spray pyrolysis, as well as a LPCVD batch furnace for four-inch wafers.

 

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